Ultra-low Reflectivity Black Silicon Pupil Masks

About this technology

Overview

NASA’s direct imaging missions for exoplanet discovery rely on coronagraph masks to reduce light scattering and diffraction. These masks play a crucial role in improving contrast and suppressing unwanted reflections, enabling the detection of faint celestial objects. However, traditional masks have limitations in absorption and surface uniformity, leading to residual reflections that hinder optimal imaging performance. This NASA innovation is a novel process utilizing cryogenic etching of black silicon (BSi) to fabricate highly absorptive pupil masks for coronagraphs. By employing black silicon structures, the technology achieves extremely high light absorption and significantly reduces specular reflectance, thereby enhancing the effectiveness of coronagraphic imaging.