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Issued patent
X-Ray Diffraction Method to Detect Defects in Cubic Semiconductor (100) Wafers
An issued NASA patent from the Technology Transfer catalog.
About this technology
Overview
NASA Langley Research Center has developed a method of using x-ray diffraction (XRD) to detect defects in cubic semiconductor (100) wafers. The technology allows non-destructive evaluation of wafer quality in a simple, fast, inexpensive process that can be easily incorporated into an existing fab line. The invention adds value throughout the semiconductor industry but is especially relevant in high end, high speed electronics where wafer quality has a more significant effect on yields.