Issued patent
Metallization for SiC Semiconductors
An issued NASA patent from the Technology Transfer catalog.
About this technology
Overview
Scientists at NASA's Glenn Research Center have developed and patented improved ohmic contacts, and a fabrication method for them, that will speed the production of silicon carbide (SiC) sensors and electronics that operate in high-temperature, harsh environments. Conventional fabrication techniques require multiple time-consuming and costly processes to form ohmic contacts separately onto donor (n-type) and acceptor (p-type) surfaces. Glenn's innovation creates universal and simultaneous ohmic contacts for both n- and p-type SiC semiconductors without compromising reliability and contact robustness. These ohmic contacts make it significantly less expensive and easier to fabricate high-temperature SiC sensors and electronics that can monitor in real time, even within harsh environments such as jet and rocket engines.