Patent — available for licensing
Tannin Based Foams Utilizing 10B-Al-N Atomic Layer Deposition
A NASA invention available to explore as a licensing opportunity.
About this technology
Overview
Atomic layer deposition (ALD) is a cost-effective nanoadditive-manufacturing technique that allows for the conformal coating of substrates with atomic control in a benign temperature and pressure environment. Through the introduction of paired precursor gases, thin films can be deposited on a myriad of substrates regardless of topography. By providing atomic layer control, where single layers of atoms can be deposited, the fabrication of metal transparent films, precise nano-laminates, and coatings of nanochannels and pores is achievable. A characteristic of the surface adsorption and reaction mechanisms in ALD is that they are normally self-limiting, allowing for atomically accurate control of nanometer (nm) thickness. Therefore, high uniformity and precise thickness control make ALD an attractive process for the creation of optical and other nano-scale devices.