Patent — available for licensing
Dust Tolerant Quick Disconnect With Self-Sealing Barrier
A NASA invention available to explore as a licensing opportunity.
About this technology
Overview
NASA Kennedy Space Center seeks partners interested in the commercial application of the Dust Tolerant Quick Disconnect With Self-Sealing Barrier. NASA's Kennedy Space Center (KSC) is offering companies licensing and partnering opportunities for the development and commercialization of this innovative technology. Designed at KSC, this technology is intended for use in dusty environments where dust particles can contaminate connectors resulting in wear on connector surfaces and unreliable connections. The Quick Disconnect (QD) employs columnar arrays of parallel filaments on both sides of a connector to remove dust from the connector surfaces prior to mating.