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Patent — available for licensing
Chemical and Topographical Surface Modifications for Insect Adhesion Mitigation
A NASA invention available to explore as a licensing opportunity.
About this technology
Overview
NASA Langley Research Center, in collaboration with ATK Space Systems, has developed a method to reduce insect adhesion on metallic substrates, polymeric materials , engineering plastics, and other surfaces. The method topographically modifies a surface using laser ablation patterning followed by chemical modification of the surface. This innovation was originally developed to enhance aircraft laminar flow by preventing insect residue buildup, but the method provides a permanent solution for any application requiring insect adhesion mitigation as well as adhesion prevention of other typical environmental contaminants.